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多腔磁控管的计算与设计原理。The calculation and design theory of multicavity magnetron.
你必须帮助磁控管安排了一系列的金属球在一个特定的模式。You must help Magnetron arrange a series of metal balls in a specific pattern.
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第二天上午，科学家斯宾塞决定把磁控管拿到一个鸡蛋旁。The next morning, Scientist Spencer decided to put the magnetron tube near an egg.
采用磁控射频溅射法制备光波导用玻璃薄膜。The glass thin film for optical waveguides is deposited by the magnetron sputtering ?
采用磁控溅射法制备锰铜薄膜，溅射和真空蒸发法制备镱薄膜。Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.
也可以单独作为磁控溅射或多弧离子镀膜机使用。This system can be used either as multi-arc or magnetron sputtering PVD individually.
磁控管需要用水制冷，因而还需要安装一些管子。The magnetron tube had to be water-cooled, so plumbing installations were also required.
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采用中频孪生非平衡磁控溅射，以纯金属钨和钛的组合靶源，制备钛掺杂WO_3电致变色薄膜。Ti-doped WO_3 films were prepared by mid-frequency dual-target magnetron sputtering method.
提出了用恒压-恒流技术驱动磁控管的新方法。A novel method to drive magnetron by constant voltage-constant current technique is proposed.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
射频溅射沉积的薄膜均匀性和致密性要优于直流溅射沉积的薄膜。However the film deposited by R. F magnetron sputtering has better uniformity and compactness.
沉积速率是磁控溅射镀膜技术中的一项重要指标，它由许多因素决定。Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
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该电源为磁控溅射镀膜设备实现自动控制提供了方便。The power supply will be convenient for controlling the magnetron sputtering coater automatically.
提出并研制成功了一种新型旋转圆柱形磁控溅射器。A new rotating cylindric magnetron sputtering is presented and successfully pro- duced by ourselves.
其特点在于小的重量和低的阴极超高频辐射。Magnetron it is characterized by small weight and a low level of the SHF radiation from a cathodic leg.
采用射频磁控溅射法在不同温度的不锈钢基片上制备了氮化铜薄膜电极。Anode materials of Cu3N thin film were prepared on stainless steel by radio frequency magnetron sputtering.
该文介绍了磁控溅射沉积技术的基本原理、发展及应用。The development, principle and applications of magnetron sputtering technique are introduced in this paper.
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利用工作于电子回旋频率的磁控管发射的微波功率在磁镜中产生了稳定的等离子体。A stable plasma in the mirror is produced by using microwave with magnetron at electron cyclotron frequency.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
后来，随着速调管和空穴磁控管的发明，科学家便对厘米波的性质进行研究。Later, with the klystron and cavity magnetron invention, scientists began to study the nature of centimeter wave.