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平版印刷术在商业上也得以运用。Lithography is used commercially as well.
另外，尼康光刻机业务也开始扭亏为盈。Nikon is also reversing its losses in lithography.
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因而是对量子光刻术的一个很大改进。All these make a great improvement to quantum lithography.
十九岁的时候，温斯洛就学会了平板印刷术。At age nineteen, Winslow learned the process of lithography.
阿斯麦公司主要为半导体行业提供刻录系统。ASML provides lithography systems for the semiconductor industry.
可聚合组合物，聚合物，抗蚀剂及蚀刻方法。Polymerizable composition, polymer, resist, and lithography methods.
光刻伺服盘是一种新的磁头伺服定位技术。Lithography servo disk is a new servo locating technique for magnetic head.
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本文综述了深亚微米光刻和纳米光刻技术。In this article, deep submicron lithography and nano processing are reviewed.
本发明提供了一种EUV光刻掩模、其制造方法与其使用方法。An EUV Lithography mask, a fabrication method, and use method thereof is provided.
追求更高的分辨率是电子束曝光研究的核心内容。Approaching higher resolution is the critical issue for electron-beam lithography.
利用电子束曝光机完成有关邻近效应的实验。The proximity effect in the E-beam lithography system was verified by experiments.
设计了一种新的紫外或深紫外光刻物镜。The design of a new kind of UV or DUV lithography lenses is described in this paper.
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为满足纳米级电子束曝光系统的要求，设计了高速图形发生器。The high speed Patten Generator is designed for nanometer E-beam lithography system.
到了十九世纪，法国艺术家对平版印刷术变得非常感兴趣。French artists in the nineteenth century became very interested in using lithography.
这篇论文是厚SU-8光刻胶接触式UV光刻后形貌的两维模拟。The 2-D simulation of thick SU-8 photoresist profile after UV lithography is presented.
对于厚SU-8胶的模拟，这种模型比普通的模拟模型更加合适。The new set of models are more proper for lithography simulation for thick SU-8 resist.
利用SDS-3电子束曝光机完成有关邻近效应的试验。The proximity effect in the SDS-3 E-beam lithography system is verified by experiments.
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提出了一种新颖的利用版图轮廓的超深亚微米光刻工艺建模流程。This paper presents a novel UDSM lithography process modeling flow using layout contours.
本文介绍了应用于亚微米电子束曝光机电源系统中的FIR滤波器。The FIR filter used in the power supply of submicron E beam lithography system is described.
用亚稳态氖原子束进行了原子光刻实验。The atomic lithography experiments were carried out by use of a metastable neon atomic beam.